发明名称 |
POLYIMIDE PRECURSOR, POLYIMIDE, VARNISH, POLYIMIDE FILM, AND SUBSTRATE |
摘要 |
A polyimide precursor comprising a repeating unit represented by the following chemical formula (1):;in which A is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and X1 and X2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms, wherein the polyimide precursor comprises at least one type of repeating unit represented by the chemical formula (1) in which A is a group represented by chemical formula (2) or (3):;in which m independently represents 0 to 3 and n independently represents 0 to 3; Y1, Y2 and Y3 each independently represent at least one selected from the group consisting of hydrogen atom, methyl group and trifluoromethyl group; and Q and R each independently represent direct bond, or at least one of —NHCO—, —CONH—, —COO— and —OCO—,;in which Z and W each independently represent a divalent aromatic group having 6 to 18 carbon atoms; and Y4 represents hydrogen atom, or a monovalent organic group. |
申请公布号 |
US2015361222(A1) |
申请公布日期 |
2015.12.17 |
申请号 |
US201314426953 |
申请日期 |
2013.09.09 |
申请人 |
UBE INDUSTRIES, LTD. |
发明人 |
Oka Takuya;Kohama Yukinori;Watanabe Yoshiyuki;Hisano Nobuharu |
分类号 |
C08G73/10;C09D179/08 |
主分类号 |
C08G73/10 |
代理机构 |
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代理人 |
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主权项 |
1. A polyimide precursor comprising a repeating unit represented by the following chemical formula (1): wherein A is a divalent group of an aromatic diamine or an aliphatic diamine, from which amino groups have been removed; and X1 and X2 are each independently hydrogen, an alkyl group having 1 to 6 carbon atoms, or an alkylsilyl group having 3 to 9 carbon atoms,wherein the polyimide precursor comprises at least one type of repeating unit represented by the chemical formula (1) in which A is a group represented by any one of the following chemical formulas (2) and (3): wherein m independently represents 0 to 3 and n independently represents 0 to 3; Y1, Y2 and Y3 each independently represent at least one selected from the group consisting of hydrogen atom, methyl group and trifluoromethyl group; and Q and R each independently represent direct bond, or at least one selected from the group consisting of groups represented by the formulas: —NHCO—, —CONH—, —COO— and —OCO—, wherein Z and W each independently represent a divalent aromatic group having 6 to 18 carbon atoms; and Y4 represents hydrogen atom, or a monovalent organic group. |
地址 |
Ube-shi, Yamaguchi JP |