| 摘要 |
The present invention relates to a substrate cleaning apparatus, and more specifically, to a substrate cleaning apparatus capable of generating unidirectional flow of a liquid for a cleaning process and thus improving efficiency of the cleaning process by having a substrate transported while being tilted, in a process of transferring the substrate to perform the cleaning process on the substrate. The substrate cleaning apparatus of the present invention includes: a first pure water cleaning zone for performing the cleaning process using pure water on the substrate which is inserted and transferred from the outside; an acid liquid chemical cleaning zone for performing the cleaning process using an acid liquid chemical on the substrate transferred from the first pure water cleaning zone; a second pure water cleaning zone for performing the cleaning process using the pure water on the substrate transferred from the acid liquid chemical cleaning zone; an alkali liquid chemical cleaning zone for performing the cleaning process using an alkali liquid chemical on the substrate transferred from the second pure water cleaning zone; a third pure water cleaning zone for performing the cleaning process using the pure water on the substrate transferred from the alkali liquid chemical cleaning zone; a drying zone for drying moisture on both surfaces of the substrate transferred from the third pure water cleaning zone; and a transfer unit which transfers the substrate continuously by being arranged from the first pure water cleaning zone to the drying zone, in order for the transferred substrate to be in a tilted state toward one side. |
