发明名称 VERTICAL FILM DEPOSITION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vertical film deposition apparatus that is small in floor occupation area, and increases in film deposition capability and does not increase in floor occupation area even when additional processes of hydrophilic pre-processing and post-processing are added to original film deposition processes.SOLUTION: There is provided a roll-to-roll vertical film deposition device 1 which continuously forms a metal oxide thin film on a rolled film base material, the roll-to-roll vertical film deposition device 1 including a vacuum chamber 15 which is decompressed into a vacuum; a vertical conveyance part which is arranged in the vacuum chamber 15, and conveys the film base material in the opposite direction from gravity; and horizontal raw material ejection parts 121, 131 which are arranged in the vacuum chamber 15, and eject at least a reactive gas 12 and metal atoms 13 of vapor to the film base material being conveyed from a horizontal direction to a film deposition part 151 which is a surface of the film base material and has the metal oxide thin film formed.
申请公布号 JP2015227488(A) 申请公布日期 2015.12.17
申请号 JP20140113615 申请日期 2014.05.31
申请人 UNIV OF YAMANASHI;YAMANASHI PREFECTURE;NAKAYA SEISAKUSHO:KK 发明人 MATSUMOTO TAKASHI;MURANAKA TSUTOMU;ONOSHIMA NORIO;HAGIWARA SHIGERU;KONO YUTAKA;HAYAKAWA AKIRA;HOSHINO SHOKO;HIRAKI SATORU;IWAMOTO SADAO
分类号 C23C14/24;C23C14/56;H01L51/50;H05B33/02;H05B33/10;H05B33/28 主分类号 C23C14/24
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