发明名称 GETTERING AGENTS IN MEMORY CHARGE STORAGE STRUCTURES
摘要 Methods of forming memory cells including a charge storage structure having a gettering agent therein can be useful for non-volatile memory devices. Providing for gettering of oxygen from a charge-storage material of the charge storage structure can facilitate a mitigation of detrimental oxidation of the charge-storage material.
申请公布号 US2015364557(A1) 申请公布日期 2015.12.17
申请号 US201514822272 申请日期 2015.08.10
申请人 MICRON TECHNOLOGY, INC. 发明人 Brewer Rhett;Ramaswamy Durai V.
分类号 H01L29/423;H01L29/49;H01L29/788 主分类号 H01L29/423
代理机构 代理人
主权项 1. A memory cell, comprising: a first dielectric adjacent a semiconductor; a control gate; a second dielectric between the control gate and the first dielectric; and a charge storage structure between the first dielectric and the second dielectric; wherein the charge storage structure comprises a charge-storage material and a gettering agent; and wherein at least a portion of the charge storage structure comprises a ratio of the gettering agent to the charge-storage material that is greater than a stoichiometric amount.
地址 Boise ID US