发明名称 |
GETTERING AGENTS IN MEMORY CHARGE STORAGE STRUCTURES |
摘要 |
Methods of forming memory cells including a charge storage structure having a gettering agent therein can be useful for non-volatile memory devices. Providing for gettering of oxygen from a charge-storage material of the charge storage structure can facilitate a mitigation of detrimental oxidation of the charge-storage material. |
申请公布号 |
US2015364557(A1) |
申请公布日期 |
2015.12.17 |
申请号 |
US201514822272 |
申请日期 |
2015.08.10 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
Brewer Rhett;Ramaswamy Durai V. |
分类号 |
H01L29/423;H01L29/49;H01L29/788 |
主分类号 |
H01L29/423 |
代理机构 |
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代理人 |
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主权项 |
1. A memory cell, comprising:
a first dielectric adjacent a semiconductor; a control gate; a second dielectric between the control gate and the first dielectric; and a charge storage structure between the first dielectric and the second dielectric; wherein the charge storage structure comprises a charge-storage material and a gettering agent; and wherein at least a portion of the charge storage structure comprises a ratio of the gettering agent to the charge-storage material that is greater than a stoichiometric amount. |
地址 |
Boise ID US |