TIN ELECTROPLATING BATH AND TIN PLATING FILM

摘要

Provided is a tin electroplating bath for obtaining a tin plating film for which the occurrence of tin whiskers when an external stress is applied on the tin plating film is limited. The tin electroplating bath is characterized in comprising at least one kind of compound selected from a group consisting of flavonoid compounds and glycosides thereof, compounds with a xanthene backbone and glycosides thereof, and compounds with an acridine backbone and glycosides thereof.