发明名称 |
MANUFACTURING DEVICE FOR CRYSTAL INGOT |
摘要 |
PURPOSE: A manufacturing device for a crystal ingot is provided to maximize single crystal growth speed by increasing radiation heat transfer and reducing the restored heat from the single crystal ingot. CONSTITUTION: A furnace(20) is installed inside a chamber(10) and contains a silicon solution. A heater(40) heats furnace. An insulating member(45) surrounds the heater and prevents the heat diffusion from the heater to the chamber. A heat shield(100) is installed between ingot and furnace to surround a single crystalline ingot and shields the heat from the silicon solution and ingot. A second shield member is a thermal shield connected to the insulating member as a flange. A first shield member(200) is extended from a closest part to a single crystalline ingot of the second shield.
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申请公布号 |
KR20100013854(A) |
申请公布日期 |
2010.02.10 |
申请号 |
KR20080075570 |
申请日期 |
2008.08.01 |
申请人 |
SILTRON INC. |
发明人 |
SIM, BOK CHEOL;JUNG YOHAN;KWAK, SOO KYOUNG;LEE, HONG WOO |
分类号 |
C30B15/00;C30B15/16 |
主分类号 |
C30B15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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