发明名称 MANUFACTURING DEVICE FOR CRYSTAL INGOT
摘要 PURPOSE: A manufacturing device for a crystal ingot is provided to maximize single crystal growth speed by increasing radiation heat transfer and reducing the restored heat from the single crystal ingot. CONSTITUTION: A furnace(20) is installed inside a chamber(10) and contains a silicon solution. A heater(40) heats furnace. An insulating member(45) surrounds the heater and prevents the heat diffusion from the heater to the chamber. A heat shield(100) is installed between ingot and furnace to surround a single crystalline ingot and shields the heat from the silicon solution and ingot. A second shield member is a thermal shield connected to the insulating member as a flange. A first shield member(200) is extended from a closest part to a single crystalline ingot of the second shield.
申请公布号 KR20100013854(A) 申请公布日期 2010.02.10
申请号 KR20080075570 申请日期 2008.08.01
申请人 SILTRON INC. 发明人 SIM, BOK CHEOL;JUNG YOHAN;KWAK, SOO KYOUNG;LEE, HONG WOO
分类号 C30B15/00;C30B15/16 主分类号 C30B15/00
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