| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-processing device capable of suppressing locally decreasing of the temperature at the center of rotation of a substrate. SOLUTION: The substrate-processing device has a rotating mechanism which makes the substrate to be processed rotate, and a plurality of lamp units 300 and 400 which heat the substrate. Each of the lamp units 300 and 400 has a heating body, having one or more connection portions comprising a plurality of filaments connected to one another, a bulb covering the heating body, and a chip provided to the valve to charge gas in the bulb. The plurality of lamp units 300 and 400 are disposed symmetric about the rotational center portion 500 of the substrate. In lamp units 300a and 300i, and 400a and 400i disposed at the positions closest to the rotational center portion 500, connection portions or chips, closest to points P1 and P2 where straight lines L1 and L2 orthogonal to the axis of rotation of the substrate and the lamp units cross each other at right angles are separated from the points P1 and P2 where they cross each other at right angles. COPYRIGHT: (C)2009,JPO&INPIT |
