| 摘要 |
PROBLEM TO BE SOLVED: To provide a resin composition shrinking smoothly a resist pattern by heat treatment, and removing easily the pattern by subsequent treatment with an aqueous alkaline solution, and a method of forming efficiently the resist pattern, using the same. SOLUTION: The resin composition for forming the fine pattern contains a resin, a crosslinking component for crosslinking the resin, and a solvent, and is used for forming the fine resist pattern. The resin contains a repeating unit (I) represented by Formula (1), where R<SP>1</SP>represents hydrogen atom, methyl group or trifluoromethyl group, and R<SP>2</SP>represents independently hydrogen atom, or a linear or branched 1-8C alkyl group, wherein R2 may be substituted with a hydroxyl group, an oxo group or an alkoxy group, or R<SP>2</SP>may be coupled each other to from a ring. COPYRIGHT: (C)2009,JPO&INPIT |
