ADJUSTING METHOD OF DILUTED AQUA REGIA, AND MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a method for simply and efficiently removing a residual thin film containing at least one of Pt and Pd especially in the manufacturing step of a semiconductor apparatus. SOLUTION: The diluted aqua regia with a predetermined concentration is adjusted by pouring hydrochloric acid, nitric acid and water in order in a predetermined vessel or pouring nitric acid, hydrochloric acid and water in order in a predetermined vessel. Then, the semiconductor apparatus during the manufacturing process is immersed in the diluted aqua regia and the residual thin film containing Pt of the semiconductor apparatus is removed. COPYRIGHT: (C)2009,JPO&INPIT