发明名称 |
METHOD OF MANUFACTURING COLOR FILTER SUBSTRATE, AND COLOR FILTER SUBSTRATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To raise contrast between an alignment mark and a colored resist and to raise alignment accuracy. <P>SOLUTION: A method of manufacturing a color filter substrate includes a step of forming the alignment mark (40) having a level difference (40s) by performing etching treatment to an noneffective region (31a) except an effective region (11a) where a colored layer is formed at a substrate surface of a substrate (10m), a step of applying a colored resist (50b) on the substrate after the step of forming the alignment mark and a step of forming the colored layer (55b) by exposing and developing the applied colored resist after performing alignment of the substrate and a photomask (200b) by optically reading the alignment mark. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009047827(A) |
申请公布日期 |
2009.03.05 |
申请号 |
JP20070212653 |
申请日期 |
2007.08.17 |
申请人 |
SEIKO EPSON CORP |
发明人 |
MOCHIZUKI HIROAKI;USHIYAMA HIDETOSHI |
分类号 |
G02B5/20;G02F1/1333;G02F1/1335 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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