HEATER HAVING INDUCTIVELY COUPLED PLASMA SOURCE AND PLASMA PROCESS CHAMBER

摘要

A heater including an inductively coupled plasma source and a plasma process chamber are provided to improve uniformity and efficiency of plasma generation by focusing a magnetic field by a magnetic core cover. A heater(10) supports and heats a subject substrate. An inductively coupled plasma source(20) is built in to generate the plasma. A base(11) supports the inductively coupled plasma source. A heater block(17) including the inductively coupled plasma source in the top is positioned in the upper part of the base. A dielectric cover(15) covers the inductively coupled plasma source installed on the top of the heater block entirely. One RF antenna coil(21) or more is installed in the bottom of the dielectric cover and is driven by receiving the RF frequency to generate the plasma in the top part of the dielectric cover.