| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method and a pattern generating apparatus for writing a pattern on a surface of an object that is independent of any physical deformation that will occur upon writing a pattern. <P>SOLUTION: The present invention relates to a method for writing a pattern on a surface of an object intended for use in an exposure apparatus, including steps of: placing an object having a thickness T being provided with a surface on a stage of the pattern generating apparatus; dividing the surface into a number of measurement points, where two adjacent measurement points being spaced a distance apart not exceeding a predetermined maximum distance P; measuring the gradient of the surface at each measurement point; calculating a two-dimensional local offset d in the x-y plane for each measurement point as a function of the gradient and the thickness T of the object; and correcting the pattern to be written on the surface by using the two-dimensional local offset d. <P>COPYRIGHT: (C)2009,JPO&INPIT |
