PROCESS FOR FABRICATING A MASK WITH SUBMILLIMETRE APERTURES FOR THE PRODUCTION OF A SUBMILLIMETRE GRID, AND SUBMILLIMETRE GRID

摘要

Process for fabricating a mask with submillimetre apertures on a surface portion of a substrate, characterized in that a "mask" layer is deposited using a solution of stabilized colloidal particles dispersed in a solvent; and the mask layer is dried until an irregular two-dimensional array of interstices is obtained, having an approximately straight edge, giving a mask with a random mesh of interstices in at least one direction. Submillimetre grid obtained by this process.