| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel manufacturing method of an electrooptical device that can make variance in substrate interval less than that of a conventional structure. <P>SOLUTION: The manufacturing method is a manufacturing method of an electrooptical device having a panel structure composed by disposing a spacer 17 defining spacings between an electrooptical substance, and first and second substrates, between the first and second substrates. When a front-stage panel structure is composed by forming a first front-stage substrate 11 as the first substrate which includes a first substrate region 11A and another first peripheral region 11B and a second front-stage substrate 12 as the second substrate which includes a second substrate region 12A and another second peripheral region 12B, and then sticking them on each other, a stack structure of a colored layer composing a color filter 15 or a protective film covering the color filter 15, and the spacer 17' is disposed between the first peripheral region 11B and second peripheral region 12B. <P>COPYRIGHT: (C)2008,JPO&INPIT |
