| 摘要 |
An apparatus for treating a substrate is provided to minimize manufacturing errors generated by outside particles by protecting the particles from flowing into the chamber. An apparatus for treating a substrate includes a fabricating chamber, a door member(540), and a sealing member(560). The fabricating chamber provides a space for preceding the treating substrate process and has an opening for connecting the space to the outside. The door member opens and shuts the opening of the fabricating chamber. The sealing member is positioned between a wall(504) of the fabricating chamber having the opening and the door member. The sealing member is made of elastic material in which gas cavities are formed. A groove is formed along an edge of the opening at the wall of the fabricating chamber.
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