发明名称 NITROGEN-FIXING MATERIAL, MANUFACTURING METHOD THEREOF, AND NITROGEN-FIXING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a contact composite material of a photocatalytically active inorganic oxide semiconductor and a conductive polymer, in which nitrogen-fixing efficiency is remarkably improved. SOLUTION: A composite photocatalytic material prepared by contact composition of the inorganic oxide semiconductor having a photocatalytic function and the conductive polymer which is soluble in a solvent or is dispersible in the solvent is irradiated with a light beam and, thereby, nitrogen gas in air is fixed as ammonium salt and ammonia. When bringing the conductive polymer material into contact with the photocatalytically active inorganic oxide semiconductor, a coating method for suppressing a decrease of the number density of oxygen defect parts performing nitrogen-fixing reaction is used. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008221037(A) 申请公布日期 2008.09.25
申请号 JP20070058585 申请日期 2007.03.08
申请人 CHIBA UNIV 发明人 HOSHINO KATSUYOSHI;SHIBA TOMOSHI
分类号 B01J35/02;B01J37/02;C01C1/04 主分类号 B01J35/02
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