| 发明名称 |
APPARATUS FOR GENERATING GAS HAVING EXTREMELY LOW OXYGEN CONCENTRATION, PROCESSING SYSTEM, THIN FILM DEPOSITION METHOD AND INERT GAS |
| 摘要 |
<p>A gas, which has extremely low oxygen concentration without particles for industrial use and is effective in a process including an oxidation preventing step, can be supplied by generating such gas by a large quantity. An apparatus for generating such gas having extremely low oxygen concentration is provided with an oxygen molecule discharging apparatus (26) which seals and firmly adheres a hollow ceramic solid electrolyte body (21) wherein a gas sent from piping passes through, and a metal piping (20).</p> |
| 申请公布号 |
WO2008114740(A1) |
申请公布日期 |
2008.09.25 |
| 申请号 |
WO2008JP54778 |
申请日期 |
2008.03.14 |
| 申请人 |
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;REDOXYON CORPORATION;SHIRAKAWA, NAOKI;YOSHIDA, YOSHIYUKI;ENDO, KAZUHIKO;MINO, TETSUYA |
发明人 |
SHIRAKAWA, NAOKI;YOSHIDA, YOSHIYUKI;ENDO, KAZUHIKO;MINO, TETSUYA |
| 分类号 |
C25B1/02;C01B23/00;C23C16/18;C23C16/56;C23C28/00 |
主分类号 |
C25B1/02 |
| 代理机构 |
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