发明名称 PIEZO-DIODE CANTILEVER MEMS
摘要 <p>A piezo thin-film diode (piezo-diode) cantilever microelectromechanical system (MEMS) and associated fabrication processes are provided. The method deposits thin-films overlying a substrate. The substrate can be made of glass, polymer, quartz, metal foil, Si, sapphire, ceramic, or compound semiconductor materials. Amorphous silicon (a-Si), polycrystalline Si (poly-Si), oxides, a-SiGe, poly-SiGe, metals, metal-containing compounds, nitrides, polymers, ceramic films, magnetic films, and compound semiconductor materials are some examples of thin-film materials. A cantilever beam is formed from the thin-films, and a diode is embedded with the cantilever beam. The diode is made from a thin-film shared in common with the cantilever beam. The shared thin-film may a film overlying a cantilever beam top surface, a thin-film overlying a cantilever beam bottom surface, or a thin-film embedded within the cantilever beam.</p>
申请公布号 WO2008114760(A1) 申请公布日期 2008.09.25
申请号 WO2008JP54830 申请日期 2008.03.10
申请人 SHARP KABUSHIKI KAISHA;HARTZELL, JOHN, W.;ZHAN, CHANGQING;SCHUELE, PAUL, J.;CONLEY, JR., JOHN, F. 发明人 ZHAN, CHANGQING;SCHUELE, PAUL, J.;CONLEY, JR., JOHN, F.;HARTZELL, JOHN, W.
分类号 H01L29/84;B81C1/00 主分类号 H01L29/84
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