发明名称 Charged particle beam apparatus
摘要 Electrification affected on a surface of a sample which is caused by irradiation of a primary charged particle beam is prevented when plural frames are integrated to obtain an image of a predetermined area of the sample in a charged particle beam apparatus. The predetermined area of the sample is scanned with a primary electron beam from an electron gun, and plural frames are generated and integrated while detecting generated secondary electrons with a detector to obtain the image of the predetermined area. If it is determined by a detection signal of the detector that an electrification amount at the predetermined area becomes a specified value when generating plural frames, an electricity removal voltage is applied to a boosting electrode to remove or reduce the electrification, prior to generation of the next frame. Accordingly, the signal-to-noise ratio of the image obtained by integrating plural frames can be improved.
申请公布号 US7714288(B2) 申请公布日期 2010.05.11
申请号 US20080149218 申请日期 2008.04.29
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 YANO TASUKU;CHENG ZHAOHUI;FURUKAWA TAKASHI;NASU OSAMU
分类号 G21K7/00;G01N23/00;G21G5/00;H01J3/14 主分类号 G21K7/00
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