FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PROTECTIVE COATING COMPOSITION, RESIST COMPOSITION, AND PATTERNING PROCESS

摘要

PURPOSE: A monomer containing fluorine, with cyclic acetal structure is provided to ensure transparency and water repellent ability against radiation of under 20nm of wave length. CONSTITUTION: A monomer containing fluorine with cyclic acetal structure is denoted by chemical formula 1. A polymeric unsaturated group of the monomer comprises acrylic acid ester, methacrylic acid ester, or alpha-trifluoromethyl acerylic acid ester. A resist protective film material contains a polymer compound having repetitive unit of chemical formula 6. The resist protective film material additionally comprises solvent. A method for forming patterns comprises: a process of applying the resist material on a substrate; a process of forming the resist protective film on a photoresist film using the resist protective film material; a process of inserting liquid between transparent lens and wafer and exposing light through a photo mask; and a step of developing.