发明名称 SOLVENT-ASSISTED LAYER FORMATION FOR IMPRINT LITHOGRAPHY
摘要 <p>A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e.g., polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.</p>
申请公布号 KR20100049005(A) 申请公布日期 2010.05.11
申请号 KR20107000756 申请日期 2008.06.17
申请人 MOLECULAR IMPRINTS, INC. 发明人 LIU WEIJUN;XU FRANK Y.;FLECTHER EDWARD B.
分类号 H01L21/027 主分类号 H01L21/027
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