发明名称 Nitride semiconductor substrate, and method for working nitride semiconductor substrate
摘要 A method for working a nitride semiconductor substrate, comprising the steps of: preparing a disk-shaped nitride semiconductor substrate comprising a plurality of striped regions having defect concentration regions in which crystal defect density is higher than in surrounding low defect regions; and forming a cut-out at a specific location along the edge of the nitride semiconductor substrate, using as a reference the direction in which at least one from among the plurality of striped regions extends.
申请公布号 US7713844(B2) 申请公布日期 2010.05.11
申请号 US20060516518 申请日期 2006.09.07
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 NISHIURA TAKAYUKI;MEZAKI YOSHIO
分类号 H01L21/00;H01L21/02;H01L21/304 主分类号 H01L21/00
代理机构 代理人
主权项
地址