| 摘要 |
PURPOSE: By using for a control antenna controlling direction and size of the induced electromotive force created in the main antenna the inductively coupled plasma source occurs the uniform high density plasma. CONSTITUTION: A reaction chamber(12) has the plasma discharge area. A main antenna(21) offers the first induced electromotive force for occurring the plasma discharge to the plasma discharge area. A dielectric window(20) is installed in the between discharge domain of the reaction chamber and main antenna. For the control antenna(22) offers the second induced electromotive force for the variable of the first induced electromotive force. |
