| 摘要 |
PURPOSE: An alignment key of a semiconductor device and a method for forming of the same are provided to replace an error of sort key and data at front side of a wafer with the sort key at the back side of the wafer. CONSTITUTION: A sort key of a semiconductor device includes a first sort key(10a) and a second sort key(20a). A first sort keys are formed in the backside of the wafer at a scribe line, and a second sort keys are formed in the front side of the wafer at the scribe line. A method of forming alignment key of the semiconductor device is comprised of the steps: a photosensitive film is coated on a first etched layer(10) of the backside of the wafer(100B); the first photosensitive patterns are formed the photosensitive film by performing exposure of coated photosensitive patterns and developing the exposure; and the first sort keys are formed by etching the first etched layers with the first photosensitive patterns as the etching mask.
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