发明名称 SEMICONDUCTOR AND METHOD FOR FORMING THE SAME
摘要 PURPOSE: A semiconductor device and a formation method are provided to prevent delay of a process basically by preventing that a laser marking formed on a wafer is not detected. CONSTITUTION: A semiconductor device includes a plurality of recesses(120) and a laser marking(110). The plural recesses are formed at the one-side part of a wafer(100). The laser marking includes a metal material(130) filled in the plural recesses. A method of manufacturing the semiconductor device is comprised of the steps: a recess is formed on one-side part of a circular wafer; the recesses are filled with a metal material; and a thin film is laminated on the wafer in which the recess is formed.
申请公布号 KR20090100074(A) 申请公布日期 2009.09.23
申请号 KR20080025454 申请日期 2008.03.19
申请人 HYNIX SEMICONDUCTOR INC. 发明人 SON, MIN SEOK
分类号 H01L23/544 主分类号 H01L23/544
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