发明名称 FOREIGN MATTER INSPECTION DEVICE, EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a foreign matter inspection device reduced in erroneous detection. <P>SOLUTION: The foreign matter inspection device has: an irradiation means for respectively irradiating the surfaces to be inspected on the front and back sides of an inspection target with luminous flux; a first detection means for detecting the scattered light from the surface to be inspected on the surface side; a second detection means for detecting the scattered light from the surface to be inspected on the back side; an arithmetic means for inspecting the respective foreign matters on the surfaces to be inspected on the front and back sides on the basis of the outputs from the first and second detection means; and a control means for controlling the irradiation means, the first and second detection means, and the arithmetic means. The irradiation means selectively irradiates the surface to be inspected on the front side or the surface to be inspected on the back side with the luminous flux and the control means allows the arithmetic means to inspect the foreign matter on the basis of the output corresponding to the simultaneous irradiation with the luminous flux and the output corresponding to the selective irradiation with the luminous flux with respect to at least one of the first and second detection means corresponding to the surface to be inspected receiving the selective irradiation with the luminous flux. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009198269(A) 申请公布日期 2009.09.03
申请号 JP20080039463 申请日期 2008.02.20
申请人 CANON INC 发明人 KAWAHARA ATSUSHI
分类号 G01N21/956;G03F1/84;G03F7/20;H01L21/027 主分类号 G01N21/956
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