MONOMER HAVING ELECTRON-WITHDRAWING SUBSTITUENT AND LACTONE SKELETON, POLYMERIC COMPOUND, AND PHOTORESIST COMPOSITION

摘要

Disclosed is a monomer having an electron-withdrawing substituent and a lactone skeleton, which is represented by formula (1) [wherein Ra represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, or the like; R1 represents a halogen atom, an alkyl group having 1 to 6 carbon atoms which may have a halogen atom, or the like; A represents an alkylene group having 1 to 6 carbon atoms, an oxygen atom, a sulfur atom, or a non-bond; m represents an integer of 0 to 8; X represents an electron-withdrawing substituent; n represents an integer of 1 to 9; and Y represents a bivalent organic group having 1 to 6 carbon atoms]. When the monomer is used in a resin for a resist or the like, the monomer enables the stability (e.g., chemical resistance) of the resin or the like to be maintained, can impart excellent solubility in an organic solvent and improved hydrolyzablity and/or solubility in water after hydrolysis to the resin or the like, and is therefore useful as a monomeric component for a highly functional polymer or the like.