发明名称 METHOD OF MANUFACTURING ELECTROOPTICAL DEVICE, AND SUBSTRATE FOR ELECTROOPTICAL DEVICE
摘要 PROBLEM TO BE SOLVED: To manufacture an electrooptical device suitable for miniaturization by enhancing reliability while preventing dielectric breakdown and element breakdown by laser scribe treatment upon manufacture thereof. SOLUTION: In a step for forming a plurality of signal lines 810 (820, 830) for inspection, high resistance parts 812 (822, 832) are disposed in a layer at least partially different from inspection terminals 103 and drawn around within a region where the inspection terminals 103 are formed on a substrate 10, and formed so as to straddle a cutting region Ct from one to the other of the substrates 10 adjacent to each other in a mother substrate S and in a step for forming the plurality of inspection terminals 103, the inspection terminals 103 are formed apart from the cutting region Ct on the substrate 10 by a prescribed distance d0 according to a spot diameter of a laser in the laser scribe treatment. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009198805(A) 申请公布日期 2009.09.03
申请号 JP20080040250 申请日期 2008.02.21
申请人 SEIKO EPSON CORP 发明人 NAGASAWA KIMIYA
分类号 G02F1/1345;G02F1/1368;G09F9/00;G09F9/30 主分类号 G02F1/1345
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