DOUBLE GUARD RING EDGE TERMINATION FOR SILICON CARBIDE DEVICES AND METHODS OF FABRICATING SILICON CARBIDE DEVICES INCORPORATING SAME
摘要
Edge termination structures for semiconductor devices are provided including a plurality of spaced apart concentric floating guard rings in a semiconductor layer that at least partially surround a semiconductor junction. The spaced apart concentric floating guard rings have a highly doped portion and a lightly doped portion. Related methods of fabricating devices are also provided herein.
申请公布号
WO2009108268(A1)
申请公布日期
2009.09.03
申请号
WO2009US00734
申请日期
2009.02.05
申请人
CREE, INC.;ZHANG, QINGCHUN;JONAS, CHARLOTTE;AGARWAL, ANANT, K.
发明人
ZHANG, QINGCHUN;JONAS, CHARLOTTE;AGARWAL, ANANT, K.