发明名称 ELECTRON BEAM APPARATUS
摘要 An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter (5-1), an electromagnetic deflector (11-1), a beam separator (12-1), and a tablet lens (17-1) as an objective lens. The beam separator (12-1) is configured such that a distance by which a secondary electron beam passes through the beam separator is approximately three times longer than a distance by which a primary electron beam passes through the beam separator. Therefore, even if a magnetic field in the beam separator is set to deflect the primary electron beam by a small angle equal to or less than approximately 10 degrees, the secondary electron beam can be deflected by approximately 30 degrees, so that the primary and secondary electron beams are sufficiently separated. Also, since the primary electron beam is deflected by a small angle, less aberration occurs in the primary electron beam. Accordingly, since a light path length of a primary electro-optical system, it is possible to reduce the influence of space charge and the occurrence of deflection aberration.
申请公布号 US2009218506(A1) 申请公布日期 2009.09.03
申请号 US20060996701 申请日期 2006.07.24
申请人 EBARA CORPORATION 发明人 NAKASUJI MAMORU;MURAKAMI TAKESHI;SATAKE TOHRU;KARIMATA TSUTOMU;KIMBA TOSHIFUMI;MIYAMOTO MATSUTARO;SOBUKAWA HIROSHI;MORI SATOSHI
分类号 H01J1/50;A61N5/00;H01J3/14 主分类号 H01J1/50
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