| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a sealing film composed of a carbon-containing silicon oxide film, which has an SiOCH composition and is obtained by the CVD with a hydrocarbon group substituted silicon compound having the having a specified structure as a raw material, and to provide a gas barrier member, an FPD device and a semi-conductor device including the film. <P>SOLUTION: The sealing film consists of carbon-containing silicon oxide formed by the CVD while an organic silicon compound having a structure in which a secondary hydrocarbon group, a tertiary hydrocarbon group, and/or a vinyl group is directly bonded to a silicon atom, for example, a substance expressed by the formula (1) is used for a raw material, wherein R<SP>1</SP>, R<SP>2</SP>, R<SP>3</SP>denote 1C-20C hydrocarbon group, R<SP>4</SP>denotes 1C-10C hydrocarbon group or a hydrogen group. m denotes the integer of 1 to 3, n denotes the integer of 0 to 2, and m+n denotes the integer of≤3. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
