| 摘要 |
PROBLEM TO BE SOLVED: To correct the zero point of a flow rate control portion, and to confirm a correction result with efficiency. SOLUTION: A substrate processing apparatus includes: a processing chamber; the flow rate control portion which adjusts the flow rate of a gas supplied into the processing chamber; and a control portion which controls the operation of the flow rate control portion. The flow rate control portion starts correction processing for correcting the zero point when receiving a correction processing start request, and transmits flow rate monitor information showing a flow rate at the zero point when the correction processing is completed. The control portion transmits the correction processing start request to the flow rate control portion before executing a substrate processing recipe, receives the flow rate monitor information from the flow rate control portion when the correction processing is completed, and determines that the correction processing has succeeded when the flow rate at the zero point is within a predetermined range or results in failure when the flow rate at the zero point is not within the predetermined range. COPYRIGHT: (C)2011,JPO&INPIT
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