发明名称 SUBSTRATE MOUNTING TABLE AND METHOD FOR MANUFACTURING THE SAME, AND SUBSTRATE PROCESSING APPARATUS
摘要 PURPOSE: A substrate mounting table, manufacturing method thereof, and substrate processing device are provided to suppress changes in thermal conduction efficiency and conduction efficiency, thereby eliminating irregularity such an etching blur. CONSTITUTION: A mounting table(5A) includes a conductive material and an insulating film(8). The insulating film is placed on a base material. A glass substrate for an FPD is mounted on a substrate mounting surface. The substrate mounting surface includes a roughening part(51) and a smoothing part(53). The roughness of the surface of the roughening part is larger than 2 micro meters and smaller than 6 micro meters. The roughness of the surface of the smoothing part is smaller than 2 micro meters.
申请公布号 KR20110061506(A) 申请公布日期 2011.06.09
申请号 KR20100121520 申请日期 2010.12.01
申请人 TOKYO ELECTRON LIMITED 发明人 MINAMI MASATO;OKUYAMA KOICHI
分类号 H01L21/683;H01L21/3065;H01L21/687 主分类号 H01L21/683
代理机构 代理人
主权项
地址