发明名称 |
SUBSTRATE MOUNTING TABLE AND METHOD FOR MANUFACTURING THE SAME, AND SUBSTRATE PROCESSING APPARATUS |
摘要 |
PURPOSE: A substrate mounting table, manufacturing method thereof, and substrate processing device are provided to suppress changes in thermal conduction efficiency and conduction efficiency, thereby eliminating irregularity such an etching blur. CONSTITUTION: A mounting table(5A) includes a conductive material and an insulating film(8). The insulating film is placed on a base material. A glass substrate for an FPD is mounted on a substrate mounting surface. The substrate mounting surface includes a roughening part(51) and a smoothing part(53). The roughness of the surface of the roughening part is larger than 2 micro meters and smaller than 6 micro meters. The roughness of the surface of the smoothing part is smaller than 2 micro meters.
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申请公布号 |
KR20110061506(A) |
申请公布日期 |
2011.06.09 |
申请号 |
KR20100121520 |
申请日期 |
2010.12.01 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MINAMI MASATO;OKUYAMA KOICHI |
分类号 |
H01L21/683;H01L21/3065;H01L21/687 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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