发明名称
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus and method for manufacturing a color filter for liquid crystal display device which can be formed as a pattern by a photolithographic method in a single base of manufacturing line, can have layers that does not require patterning to be formed, and is suitable for small-lot production. <P>SOLUTION: The manufacturing apparatus includes (1) a bypass mechanism 90, which is present adjacent to a developing device 60, in parallel with it and conveys a glass substrate from an exposing device 50 to a post-baking device 70, while bypassing the developing device, (2) a distributing and transferring mechanism R1 which transfers the glass substrate from the exposing device to the developing device and from the exposing device to the bypass mechanism 90; (3) a distributing-back transferring mechanism R2, which transfers the glass substrate from the developing device to the post-baking device and from the bypass mechanism to the post-baking device; and (4) a control mechanism which controls the distribution and transfer mechanism and distributing-back and transfer mechanism. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP4696872(B2) 申请公布日期 2011.06.08
申请号 JP20050338169 申请日期 2005.11.24
申请人 发明人
分类号 G02B5/20;G02F1/1335 主分类号 G02B5/20
代理机构 代理人
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