POLY SILICON DEPOSITION DEVICE

摘要

PURPOSE: A polysilicon depositing device is provided to deposit polysilciion with high purity by including an opening and closing unit which opens and closes a gas storage tank to flow reaction gas toward a silicon core rod. CONSTITUTION: A reactor(110) includes a gas inlet(111) and a gas outlet(112) to discharge gas to the outside. An electrode unit(121) includes a first electrode and a second electrode which are separated from each other with a preset space. A silicon core rod(122) conducts a current in a second electrode and generates heat by itself. A silicon core rod heating unit(123) is arranged along the outer side of the silicon core rod. A gas storage tank(124) stores reaction gas inputted from the gas inlet.