| 摘要 |
PURPOSE: A foreign material removing apparatus of layer structure is provided to improve the efficiency of cleaning a film by applying ultrasonic vibration to the top and bottom surfaces of the film so as to prevent influence of foreign materials on the cleaned surface. CONSTITUTION: A foreign material removing apparatus of layer structure comprises a cleaning unit(100), a drying and neutralizing unit(200), and an inverting unit(300). The cleaning unit applies ultrasonic vibration to the top and bottom surfaces of a film at the same time using cleaning solution being circulated, thereby removing foreign materials. The drying and neutralizing unit is located on the top of the cleaning unit in order to dry cleaning solution remaining in the film and neutralize static electricity. The inverting unit transfers a film from the cleaning unit of the lower side to the drying and neutralizing part of the upper side.
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