| 摘要 |
PROBLEM TO BE SOLVED: To provide a washing apparatus, a drying apparatus, and a washing system which an efficiently suppress washing unevenness and drying unevenness even having compact configurations. SOLUTION: When a valve V1 is opened after apertures 11 and 12 are shut with a shutter 13, hot water supplied from a liquid supply source WP is continuously sprayed to a component W (herein, an object to be washed) fixed in a chuck 20 through fine holes 31e and 31f as well as fine holes 31g and 31h. Alternatively, a valve V2 is periodically opened or closed to intermittently spray air supplied from an air pressure source AP through fine holes 31i and 31j as well as fine holes 31k and 31m. Consequently, the surface of the component W is washed in a state that air and hot water are mixed, so that a high washing effect can be obtained. COPYRIGHT: (C)2011,JPO&INPIT
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