| 发明名称 |
NANOIMPRINT RESIST, NANOIMPRINT MOLD AND NANOIMPRINT LITHOGRAPHY |
| 摘要 |
A nanoimprint resist includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), and a diluent solvent. A method of a nanoimprint lithography is also provided.
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| 申请公布号 |
US2010308008(A1) |
申请公布日期 |
2010.12.09 |
| 申请号 |
US20100717952 |
申请日期 |
2010.03.05 |
| 申请人 |
TSINGHUA UNIVERSITY;HON HAI PRECISION INDUSTRY CO., LTD. |
发明人 |
ZHU ZHEN-DONG;LI QUN-QING;ZHANG LI-HUI;CHEN MO |
| 分类号 |
C23F1/00;B29C59/00;C08L63/00;C08L75/04 |
主分类号 |
C23F1/00 |
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