| 摘要 |
PURPOSE: An in-line type substrate processing system and a processing chamber are provided to reduce tact time by simplify the system in order to reduce transferring distances. CONSTITUTION: A processing chamber(40) performs processes with respect to a substrate. An auxiliary chamber(30) exchanges the substrate with the processing chamber. A loading station(10) exchanges the substrate with the auxiliary chamber. A buffer station(20) is arranged between the auxiliary chamber and the loading station. Frames(11, 21) are respectively arranged in the loading station and the buffer station. |
