| 摘要 |
PROBLEM TO BE SOLVED: To provide a CMOS type solid-state imaging element that includes fine pixels and has high sensitivity and low color mixing. SOLUTION: In the back irradiation type solid-state imaging element, the sensitivity is enhanced by making large an opening for introducing light by a back irradiation type by providing a light guide region on a back surface of a photodiode 8 of the back irradiation type solid-state imaging element, and the color mixing is reduced by adopting a light guide region structure. COPYRIGHT: (C)2011,JPO&INPIT
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