发明名称 DEVICE SPRAYING HIGH TEMPERATURE GAS ON LOW TEMPERATURE SUBSTRATE IN TWO STEPS
摘要 PROBLEM TO BE SOLVED: To prevent a substrate from being deformed or cracked in the film due to stress of a burnt film, when the substrate is placed on a support stand, and the film on the substrate is burnt so as to form the film by not heating the substrate from the support stand but spraying gas of a high temperature from the substrate. SOLUTION: Burning heat treatment for spraying gas of the high temperature with a fixed heat amount from the support stand of the substrate and for spraying gas with not less than the fixed heat amount is performed. A difference of the heat amount is given by a gas temperature, a gas flow rate, moving speed of the substrate, and a difference between the substrate, and a gas spraying device. Heat burning treatment can also be performed on a bendable sheet-like resin substrate. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2010278076(A) 申请公布日期 2010.12.09
申请号 JP20090126834 申请日期 2009.05.26
申请人 PHILTECH INC 发明人 FURUMURA YUJI;MURA NAOMI;NISHIHARA SHINJI
分类号 H01L21/205;B05D1/02;H01L21/677 主分类号 H01L21/205
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