发明名称 Microfabrication using replicated patterned topography and self-assembled monolayers
摘要 A method of selectively and electrolessly depositing a metal onto a substrate having a metallic patterned-nanostructure surface is disclosed. The method includes providing a tool having a patterned-nanostructure surface, the patterned-nanostructure surface having surface regions having a nanostructured surface, replicating the tool patterned-nanostructure surface onto a substrate to form a substrate patterned-nanostructure surface, disposing a metal layer on the substrate patterned-nanostructure surface to form a metallic patterned-nanostructure surface region, forming a self-assembled monolayer on the metallic patterned-nanostructure surface region, exposing the self-assembled monolayer to an electroless plating solution comprising a deposit metal, and depositing electrolessly the deposit metal selectively on the surface regions having a metallic nanostructured surface. Articles formed from this method are also disclosed.
申请公布号 US7871670(B2) 申请公布日期 2011.01.18
申请号 US20050200551 申请日期 2005.08.10
申请人 3M INNOVATIVE PROPERTIES COMPANY 发明人 NGUYEN KHANH P.;FREY MATTHEW H.;ZHANG HAIYAN;ZHANG JUN-YING
分类号 B05D1/36;B05D3/00;B05D3/10;C23C18/18;C23C18/31;C23C18/34;C23C18/40;C23C18/44;C23C18/48;C23C18/50 主分类号 B05D1/36
代理机构 代理人
主权项
地址