| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reflective mask blank capable of improving thermal stability of reflectivity. <P>SOLUTION: The reflective mask blank includes: a substrate; a multilayer reflective film 2, formed on the substrate, for reflecting exposure light; and an absorber film, formed on the multilayer reflective film, for absorbing the exposure light. The multilayer reflective film is formed of a material formed by alternately laminating silicon layers 7 and molybdenum layers 6, wherein diffusion prevention layers 8 each formed of a material containing molybdenum and carbon, for instance, diffusion prevention layers each formed of molybdenum carbide, dimolybdenum carbide or nitride thereof are formed between the silicon layers 7 and the molybdenum layers 6. <P>COPYRIGHT: (C)2011,JPO&INPIT |
