发明名称 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus, system, and method that temporarily stores substrates by a simple structure without changing the processing order of the substrates in the subsequent apparatus.SOLUTION: A plurality of substrates 9 are temporarily stored in a first buffer 70 arranged closer to the upstream side in the transfer direction than a processing position 22a. Then, the substrates 9 are temporarily stored in a second buffer 80 arranged closer to the downstream side in the transfer direction than the processing position 22a. The first buffer 70 and the second buffer 80 are LIFO buffers, thereby allowing them to be achieved by a simpler structure than a FIFO buffer. The plurality of substrates 9 are stored in both the first buffer 70 and the second buffer 80, thereby allowing the substrates 9 to be carried out from the second buffer 80 in the same order as that when the substrates 9 are carried in. A change of the transfer order of the substrates 9 in the subsequent apparatus is prevented thereby.
申请公布号 JP2011210929(A) 申请公布日期 2011.10.20
申请号 JP20100076858 申请日期 2010.03.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 ISHIKAWA TOSHIJI;FUKUHARA FUMITO;SATO TAKAYUKI;YAMAOKA HIDETO;NAKANE SHINGO;ABE HIROSHIGE;YONEYAMA NORITAKA;YOSHITANI MITSUAKI
分类号 H01L21/677;B65G49/07 主分类号 H01L21/677
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