| 发明名称 |
CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME |
| 摘要 |
A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.
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| 申请公布号 |
US2012006788(A1) |
申请公布日期 |
2012.01.12 |
| 申请号 |
US201013256397 |
申请日期 |
2010.06.23 |
| 申请人 |
FUJIMORI TORU;SHIRAKAWA KOJI;USA TOSHIHIRO;SUGIYAMA KENJI;ITO TAKAYUKI;TSUBAKI HIDEAKI;NISHIMAKI KATSUHIRO;HIRANO SHUJI;TAKAHASHI HIDENORI;FUJIFILM CORPORATION |
发明人 |
FUJIMORI TORU;SHIRAKAWA KOJI;USA TOSHIHIRO;SUGIYAMA KENJI;ITO TAKAYUKI;TSUBAKI HIDEAKI;NISHIMAKI KATSUHIRO;HIRANO SHUJI;TAKAHASHI HIDENORI |
| 分类号 |
C23F1/02;C08F216/02;C08F228/02;G03F7/004 |
主分类号 |
C23F1/02 |
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