发明名称 METHOD FOR FORMING TRANSPARENT CONDUCTIVE FILM, AND TRANSPARENT CONDUCTIVE FILM
摘要 <P>PROBLEM TO BE SOLVED: To obtain a transparent conductive film having a large-area, a high transmittance and a low resistivity by a simple method. <P>SOLUTION: The method includes a process which arranges camphor to a first region of a CVD reaction vessel, a process which arranges a substrate which forms a graphene sheet in a second region of the CVD reaction vessel, a process which introduces the steam of camphor on the substrate (Ni) arranged to the heated second region by heating the first region, vaporizing the camphor and letting a carrier gas of inert gas flow from the first region to the second region in the CVD reaction vessel, and a process which obtains a graphene sheet on the substrate by thermally decomposing the steam of camphor on the substrate arranged to the heated second region. And, it has a process which makes the graphene sheet exfoliate into an etching solution by wet etching the surface of substrate in contact with the graphene sheet, and a process which sticks the graphene sheet which was exfoliated into the etching solution on an object. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012020915(A) 申请公布日期 2012.02.02
申请号 JP20100161678 申请日期 2010.07.16
申请人 UMENO MASAYOSHI 发明人 UMENO MASAYOSHI;WAKITA KOICHI;GOLAP KALITA
分类号 C01B31/02;C23C16/26;H01B5/14;H01B13/00 主分类号 C01B31/02
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