EXPOSURE APPARATUS AND METHOD FOR ALIGNING THE SAME

摘要

PURPOSE: An exposing apparatus and a method for aligning the exposing apparatus are provided to efficiently manage exposing processes by monitoring the tilted state of a digital micromirror device(DMD) in real time. CONSTITUTION: An exposing apparatus includes a light source(120), a DMD(130), a tilt measuring part(140), a beam expanding unit(150), a multi-array lens(160), a projection lens(170), and a stage(110). The DMD emits light from the light source in the form of light with patterns. The tilt measuring part measures the tilted value of the DMD. The beam expanding unit expands light from the DMD. The multi-array lens separates light from the beam expanding unit into a plurality of light and concentrates the separated light. The projection lens adjusts the resolution of the concentrated light and penetrates the light. The stage is arranged under the projection lens. A substrate(S) is loaded on the stage.