发明名称 PLASMA PROCESSING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma processing apparatus for subjecting a small to large amount of powder to glow plasma processing at an atmospheric pressure uniformly to impart a useful functional group to a surface thereof. <P>SOLUTION: The plasma processing apparatus includes: a discharge container 1 having a center electrode 2 and a cylindrical peripheral electrode 3 arranged with a predetermined gap 5 from the center electrode 2; a plurality of partitions 16 continuously provided between the center electrode 2 and the cylindrical peripheral electrode 3; a dielectric 4 provided to at least either a surface of the central electrode 2 or a surface of the peripheral electrode 3; a fluid injection means provided on one end side of the discharge container 1 and constituted to be capable of injecting a fluid into the gap 5; a fluid discharge means provided on the other end side of the discharge container 1 and constituted to be capable of discharging the fluid from the gap 5; and a rotary means for rotating the discharge container around the central electrode in a state that AC or pulse voltage is applied between the central electrode 2 and the peripheral electrode 3. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2012196669(A) 申请公布日期 2012.10.18
申请号 JP20120102391 申请日期 2012.04.27
申请人 NAKAMURA SANGYO GAKUEN 发明人 KOGA KEIKO
分类号 B01J19/08;H05H1/24 主分类号 B01J19/08
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