发明名称 |
COMPOUND, RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING COMPOUND, POLYMER, RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound useful as a radical polymerization initiator; to provide a radical polymerization initiator comprising the compound; to provide a method for producing the compound; to provide a polymer useful for resist compositions; to provide a resist composition containing the polymer, and to provide a method for forming a resist pattern using the resist composition. <P>SOLUTION: The compound represented by formula (I), [wherein, R<SP POS="POST">1</SP>is a 1-10C hydrocarbon group; Z is a 1-10C hydrocarbon group or cyano; R<SP POS="POST">1</SP>and Z may be bound to each other to form a ring; X is a divalent connection group, and has one of -O-C(=O)-, -NH-C(=O)- and -NH-C(=NH)- at a terminal contacting with Q; R<SP POS="POST">2</SP>is a single bond, an alkylene which may have one or more substituents, or an arylene group which may have one or more substituents; q and r are each independently 0 or 1; and A<SP POS="POST">+</SP>is a metal cation or an organic cation]. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013001850(A) |
申请公布日期 |
2013.01.07 |
申请号 |
JP20110135672 |
申请日期 |
2011.06.17 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
UTSUMI YOSHIYUKI;DAZAI NAOHIRO;IWASHITA ATSUSHI;KONNO TAKEMICHI |
分类号 |
C08F4/04;G03F7/004;G03F7/039;H01L21/027 |
主分类号 |
C08F4/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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