发明名称 |
PLASMA PROCESSING APPARATUS, MICROWAVE INTRODUCTION DEVICE, AND PLASMA PROCESSING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a microwave plasma processing apparatus that is not always required to have a microwave introduction mechanism over a processing container, and has high flexibility in device design. <P>SOLUTION: A microwave introduction device 5 includes a microwave output part 50 which generates a microwave and also distributes and outputs the microwave to a plurality of paths, an antenna unit 60 which guides the microwave output from the microwave output part 50 into a processing container 2, and a microwave radiation module 80 which radiates the microwave introduced by the antenna unit 60 in the processing container 2. The microwave radiation module 80 has a microwave transmission plate 81 as a dielectric window member and a cover member 82 as a conductor member. The cover member 82 restricts the direction of the microwave so that the microwave introduced into the processing container 2 through the microwave transmission plate 81 travels toward a wafer W. <P>COPYRIGHT: (C)2013,JPO&INPIT |
申请公布号 |
JP2013045551(A) |
申请公布日期 |
2013.03.04 |
申请号 |
JP20110181478 |
申请日期 |
2011.08.23 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
FUJINO YUTAKA;UEDA ATSUSHI;OZAKI AKINORI;KITAGAWA JUNICHI |
分类号 |
H05H1/46;C23C16/511;H01L21/205;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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