发明名称 PLASMA PROCESSING APPARATUS, MICROWAVE INTRODUCTION DEVICE, AND PLASMA PROCESSING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a microwave plasma processing apparatus that is not always required to have a microwave introduction mechanism over a processing container, and has high flexibility in device design. <P>SOLUTION: A microwave introduction device 5 includes a microwave output part 50 which generates a microwave and also distributes and outputs the microwave to a plurality of paths, an antenna unit 60 which guides the microwave output from the microwave output part 50 into a processing container 2, and a microwave radiation module 80 which radiates the microwave introduced by the antenna unit 60 in the processing container 2. The microwave radiation module 80 has a microwave transmission plate 81 as a dielectric window member and a cover member 82 as a conductor member. The cover member 82 restricts the direction of the microwave so that the microwave introduced into the processing container 2 through the microwave transmission plate 81 travels toward a wafer W. <P>COPYRIGHT: (C)2013,JPO&INPIT
申请公布号 JP2013045551(A) 申请公布日期 2013.03.04
申请号 JP20110181478 申请日期 2011.08.23
申请人 TOKYO ELECTRON LTD 发明人 FUJINO YUTAKA;UEDA ATSUSHI;OZAKI AKINORI;KITAGAWA JUNICHI
分类号 H05H1/46;C23C16/511;H01L21/205;H01L21/3065 主分类号 H05H1/46
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